LSRL offers world-class epitaxial manufacturing services to customers around the world.
Featuring:
- 24/7 operation
- Fast turn-around
- High Yield (>99.7%)
- ISO 9001:2015 quality certification
- Flexible order size: small lots to thousands of wafers
- High quality processes for 3″ – 8″ epitaxial wafers (patterned & non-patterned)
- Epitaxial processes on Sapphire and SOI
- Epitaxial processes ranging from Si:B, Si:As, Si:P for almost any application
- Epitaxial thickness ranging from 1µm – 100µm
- Epitaxial carrier concentrations ranging from 5E+13 to >1E20
- Excellent uniformity and resistivity control
- Extensive experience with optimizing minimal pattern shift and distortion in thicker buried layer
- Extensive experience with optimizing other critical parameters (in situ HCl etch, etc.)
- Ability to expand to meet growing customer demand
- Daily WIP tracking and reporting
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