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LSRL offers world-class epitaxial manufacturing services to customers around the world.


  • 24/7 operation
  • Fast turn-around
  • High Yield (>99.7%)
  • ISO 9001:2015 quality certification
  • Flexible order size: small lots to thousands of wafers
  • High quality processes for 3″ – 8″ epitaxial wafers (patterned & non-patterned)
  • Epitaxial processes on Sapphire and SOI
  • Epitaxial processes ranging from Si:B, Si:As, Si:P for almost any application
  • Epitaxial thickness ranging from 1µm – 100µm
  • Epitaxial carrier concentrations ranging from 5E+13 to >1E20
  • Excellent uniformity and resistivity control
  • Extensive experience with optimizing minimal pattern shift and distortion in thicker buried layer
  • Extensive experience with optimizing other critical parameters (in situ HCl etch, etc.)
  • Ability to expand to meet growing customer demand
  • Daily WIP tracking and reporting